Sticking to your belief of "Creating solutions of high quality and generating buddies with people from all around the world", we always put the fascination of customers to start with for
Ce En149 Cone Shape Mask
, Niosh N95 Face Mask
, Paint Respirator
, The concept of our company is "Sincerity, Speed, Service, and Satisfaction". We will follow this concept and win more and more customers' satisfaction.
High Quality for Ffp2 Dust Mask -
SS9001-FFP2 Disposable Particulate Respirator – Shining Star Detail:
These masks are intended to be used for protection against solid and liquid aerosols in wood, cement, glass working, textile, and mining and construction environments. They are extremely durable and have a soft and comfortable inner surface with adjustable nosepiece and secured headband for a proper fit. There is a low breathing resistance for increased working comfort. All FFP2 masks are to be used in concentrations of contaminate up to 6times the Occupational Exposure Level (OEL) and comply with EN149:2001+A1:2009 FFP2 standard requirement.
For use against Solid and Liquid Aerosols
Product Characteristic:
Inhalation Resistance Delta P (30LPM + 1LPM): <7mmH2O
Inhalation Resistance Delta P (95LPM + 1LPM): <24mmH2O
Filtration Efficiency (Test Aerosol NaCl 1%): >94%
Filtration Efficiency (Test Aerosol Paraffin Oil or DOP): >94%
Headband Pull Strength: 20N/10s
Exhalation Valve Leakage Test: < 30ml/min
Exhalation Valve Weld Strength: 10N/10s
Product detail pictures:
Related Product Guide:
We are convinced that with joint efforts, the business between us will bring us mutual benefits. We can assure you product quality and competitive price for
High Quality for Ffp2 Dust Mask -
SS9001-FFP2 Disposable Particulate Respirator – Shining Star , The product will supply to all over the world, such as: Cyprus
, Spain
, Jersey
, We are seeking the chances to meet all the friends from both at home and abroad for the win-win cooperation. We sincerely hope to have long-term cooperation with all of you on the bases of mutual benefit and common development.